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Major Photonic Device Characterization Facilities: Photonic Design and Simulation: Rsoft V8.3RC5 design suite including BeamProp, Fullwave, Bandsolver, ModeProp, Diffract-Mod and FemSim, which can provide accurate design and simulation for the hybrid nanophotonic structures integrating both photonic crystals and surface plasmons Comsol 3.5b for wave optics simulation Other design software accessed through the School of EECS and the College of Engineering includes: AnSoft HFSS V15, Solidworks, Cadence and Matlab. Advanced simulation workstation HP Z400 with Xeon quad-core micro-processor and 24GB memory Fabrication Facilities: The Owen Cleanroom at OSU has campus-shared photolithography facilities and thin-film deposition systems, including direct write laser lithography and contacting photolithography to create micro- and nano- scale devices. Other commonly used fabrication facilities, such as metal sputtering, reactive ion etching, and plasma-enhanced chemical vapor deposition (PECVD) system are also available. The Electron Microscopy Facility (EMF) provides advanced electron microscopy instrumentation services to OSU research communities. The facilities include FEI TITAN 80-200 TEM/STEM with ChemiSTEM Technology, FEI QUANTA 3D dual beam SEM/FIB, FEI NOVA NanoSEM 230 high resolution SEM, and Leica DM 5000 computerized fluorescence optical microscope Major Device Characterization Facilities: Lab space: three optical characterization rooms with more than 1,500 square feet Optical testing tables: Three large (10'x 4') floating optical tables with vibration isolation Three floating optical breadboard tables (5'x 3') Laser & light sources: Two Mellis-Griot HeNe lasers: 632.8 nm, 5mW SDL CW high power CW fiber laser: 1112nm, 10W LSI DLM-220 dye laser: 514nm, 3ns pulse Newport 5-channel DWDM laser array at C-band Newport 2010M tunable DFB laser: 1.48-1.62 um Three Nd:YAG lasers: 1064 nm and 512 nm, 10W Thorlabs broadband IR ASE diode laser: 1.5-1.6 um Carlmar femtosecond pulsed fiber laser: 0.1ps pulse, 20mW Avantes white light source: vis-IR Intralux fiber optic illuminator Various semiconductor laser diodes and LEDs Photodetectors and power meters: VIC silicon photomultiplier Two Thorlab InGaAs fixed gain photodetectors Thorlab CCD cameras Newport PMKIT power meter: 0.1nm-2W Thorlab fiber-optic power meter: 800-1700nm Thorlab USB PM100 power and energy meter with Si and Ge detectors Optical spectroscopy equipment: Ando AQ6317B optical spectrum analyzer HP70951 optical spectrum analyzer Ocean-optics USB2000 UV-VIS spectrum analyzer Three Chromex scanning monochromators Beam scanner Prologix USB-GPIB spectrum analyzer Other optoelectronic equipment: 10GHz LiNbO3 intensity modulator Multiple thorlabs and Newport 3-axis, 4-axis, and 5-axis alignment stages Various fiber splitters Fiber-optic polarizers, attenuators, and isolators Fabry-Perot interferometer Electronic equipment: Three Princeton Applied Research lock-in amplifier, and one Stanford Research amplifiers up to 250MHz Fluke 1GHz function generator, multiplex Tektronix function generators Three Tektronix digital oscilloscopes Dual channel Wavetek synthesized arbitrary waveform generator Standford Research 4-channel pulse and delay generator 1500V voltage supply
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Owen Hall 333: Optical Characterization Lab I |
Dearborn Hall 302A: Optical Characterization Lab II |
Dearborn Hall 206: Graduate and Undergraduate Education Lab |
Major Equipment Photos |
Photo will come soon |
Photo will come soon |
Photos will come soon |
Optical Scattering Method to characterize liquid droplet diffusion from Inkjet Printer |
Thermo-reflectance Method to characterize thermal diffusivity of thin film |