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Major Photonic Device Characterization Facilities:

Photonic Design and Simulation:

      Rsoft V8.3RC5 design suite including BeamProp, Fullwave, Bandsolver, ModeProp, Diffract-Mod and FemSim, which can provide accurate design and simulation for the hybrid nanophotonic structures integrating both photonic crystals and surface plasmons

      Comsol 3.5b for wave optics simulation

      Other design software accessed through the School of EECS and the College of Engineering includes: AnSoft HFSS V15, Solidworks, Cadence and Matlab.

      Advanced simulation workstation HP Z400 with Xeon quad-core micro-processor and 24GB memory

Fabrication Facilities:

      The Owen Cleanroom at OSU has campus-shared photolithography facilities and thin-film deposition systems, including direct write laser lithography and contacting photolithography to create micro- and nano- scale devices. Other commonly used fabrication facilities, such as metal sputtering, reactive ion etching, and plasma-enhanced chemical vapor deposition (PECVD) system are also available. 

      The Electron Microscopy Facility (EMF) provides advanced electron microscopy instrumentation services to OSU research communities. The facilities include FEI TITAN 80-200 TEM/STEM with ChemiSTEM Technology, FEI QUANTA 3D dual beam SEM/FIB, FEI NOVA NanoSEM 230 high resolution SEM, and Leica DM 5000 computerized fluorescence optical microscope

Major Device Characterization Facilities:

      Lab space: three optical characterization rooms with more than 1,500 square feet

      Optical testing tables:

Three large (10'x 4') floating optical tables with vibration isolation

Three floating optical breadboard tables (5'x 3')

      Laser & light sources:

Two Mellis-Griot HeNe lasers: 632.8 nm, 5mW

SDL CW high power CW fiber laser: 1112nm, 10W

LSI DLM-220 dye laser: 514nm, 3ns pulse

Newport 5-channel DWDM laser array at C-band

Newport 2010M tunable DFB laser: 1.48-1.62 um

Three Nd:YAG lasers: 1064 nm and 512 nm, 10W

Thorlabs broadband IR ASE diode laser: 1.5-1.6 um

Carlmar femtosecond pulsed fiber laser: 0.1ps pulse, 20mW

Avantes white light source: vis-IR

Intralux fiber optic illuminator

Various semiconductor laser diodes and LEDs

      Photodetectors and power meters:

VIC silicon photomultiplier

Two Thorlab InGaAs fixed gain photodetectors

Thorlab CCD cameras

Newport PMKIT power meter: 0.1nm-2W

Thorlab fiber-optic power meter: 800-1700nm

Thorlab USB PM100 power and energy meter with Si and Ge detectors

       Optical spectroscopy equipment:

Ando AQ6317B optical spectrum analyzer

HP70951 optical spectrum analyzer

Ocean-optics USB2000 UV-VIS spectrum analyzer

Three Chromex scanning monochromators

Beam scanner

Prologix USB-GPIB spectrum analyzer

        Other optoelectronic equipment:

10GHz LiNbO3 intensity modulator

Multiple thorlabs and Newport 3-axis, 4-axis, and 5-axis alignment stages

Various fiber splitters

Fiber-optic polarizers, attenuators, and isolators

Fabry-Perot interferometer

         Electronic equipment:

Three Princeton Applied Research lock-in amplifier, and one Stanford Research amplifiers up to 250MHz

Fluke 1GHz function generator, multiplex Tektronix function generators

Three Tektronix digital oscilloscopes

Dual channel Wavetek synthesized arbitrary waveform generator

Standford Research 4-channel pulse and delay generator

1500V voltage supply

 

Owen Hall 333: Optical Characterization Lab I

Dearborn Hall 302A: Optical Characterization Lab II

Dearborn Hall 206: Graduate and Undergraduate Education Lab

                    Major Equipment Photos

Photo will come soon

Photo will come soon

Photos will come soon

Optical Scattering Method to characterize liquid droplet diffusion from Inkjet Printer

Thermo-reflectance Method to characterize thermal diffusivity of thin film