Novel Materials and Devices Group: Facilities
Electrical Engineering and Computer Science | Materials Science | Oregon State University
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Group WIKI
Under construction...
Installed August 2008: Picosun SUNALE R-150B 6" Atomic Layer Deposition (ALD) reactor with 1 Picosolid Booster, 1 Picosolid, and 3 Picosolution precursor sources.
Recipes developed:
1.
Al2O3 (TMA/H2O)
2. ZnO (DEZ/H2O)
3. Ta2O5 (TaCl5/H2O)
Under development
1. TiO2
2. ZrO2
3. various metal oxides
John F. Conley, Jr.: jconley@ eecs.oregonstate.edu, ph (541)737-9874, 3089 Kelley Engineering Center