Novel Materials and Devices Group: Facilities
Electrical Engineering and Computer Science | Materials Science | Oregon State University

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Atomic Layer Deposition (ALD) Chambers

1) Installed Fall 2013: Picosun SUNALE R-200 200mm Plasma Enhanced ALD system. The R-200 system is load locked, can handle 200 mm wafers, and is equipped to handle four source lines (including two low vapor pressure) and three plasma gasses.

R200 Group Photo

2) Installed Fall 2010: Arradiance Gemstar (see press release); 150mm ALD reactor with 3D substrate capability, in-situ quartz crystal microbalance, and 5 precursor source lines (1 gas; 2 vapour draw for liquids; and 2 low vapor pressure sources, heated up to 120C, one with N2 boost)

ArradianceArradianceArradianceOpen

3) Installed August 2008: Picosun SUNALE R-150B; 150mm ALD reactor, 50-500C, with 2 Picosolid Boosters sources (up to 150C) and 3 Picosolution precursor sources (Peltier cooled).
PicosunR150

ALD Materials:
- Al2O3 (TMA / H2O) - Thermal and PEALD
- HfO2 (TEMA-Hf / H2O)
- ZnO (DEZ / H2O)
- Ta2O5 ( Ta2(OC2H5)10 / H2O and TaCl5 / H2O)
- TiO2 (TiCl4 / H2O or Ti-tetraisopropoxide / H2O)
- ZrO2 (TEMA-Zr / H2O)
- SnO2 (TDMA-Sn / H2O)
- SiO2 PEALD (Bis(DiEthylAmino)Silane (BDEAS) / O2 plasma)
- Bi2O3 (Bi(OCMe2 iPr)3 and H2O)
- Nb2O5 (Nb2(OC2H5)10 / H2O)
- Various nanolaminates

Under development:
- Various metal oxides
- Even more nanolaminates

Nanowire Growth Systems

1) Owen System: Two zone vacuum furnace with MFC gas flow control of N2 and O2, separate tubes for carbonization of photoresist and parylene CVD

NWFurnace

2) Kelley System: Two zone atmospheric furnace with MFC gas flow control of N2 and O2

Electrical Test

Two fully equipped probestations with standard Agilent I-V and C-V characterazation equipment; hot chuck

Semiconductor Fabrication

Standard film deposition, etch, clean, lithography, etc. available in co-located OSU cleanroom

See OSU Materials Synthesis and Characterization (MASC) Facility Website:

Analytical

OSU Electron Microscopy Facility: TEM & SEM

Spectroscopic ellipsometry, Atomic Force Microscopy, x-ray diffraction, x-ray reflectivity available in shared use facilities on campus

Misc

Other analytical support available through ONAMI facilities such as CAMCOR, CEMN, and EMIF

Probostat

John F. Conley, Jr.: jconley@ eecs.oregonstate.edu, ph (541)737-9874, 3089 Kelley Engineering Center