Novel Materials and Devices Group: Facilities
Electrical Engineering and Computer Science | Materials Science | Oregon State University

Under construction...

Atomic Layer Deposition (ALD) Chambers

1) Coming Summer 2013: Picosun SUNALE 200mm Plasma ALD system.

2) Installed Fall 2010: Arradiance Gemstar (see press release); 150mm ALD reactor with 3D substrate capability, in-situ quartz crystal microbalance, and 5 precursor source lines (1 gas; 2 vapour draw for liquids; and 2 low vapor pressure sources, heated up to 120C, one with N2 boost)

3) Installed August 2008: Picosun SUNALE R-150B; 150mm ALD reactor, 50-500C, with 2 Picosolid Boosters sources (up to 150C) and 3 Picosolution precursor sources (Peltier cooled).

Recipes developed:
- Al2O3 (TMA / H2O)
- ZnO (DEZ / H2O)
- Ta2O5 (TaCl5 / H2O or Ta-ethoxide / H2O)
- TiO2 (TiCl4 / H2O or Ti-tetraisopropoxide / H2O)
- ZrO2 (TEMA-Zr / H2O)
- SnO2 (TDMA-Sn / H2O)
- Various nanolaminates

Under development:
- HfO2
- various metal oxides
- Nanolaminates

Nanowire Growth Systems

1) Owen System: Two zone vacuum furnace with MFC gas flow control of N2 and O2, separate tubes for carbonization of photoresist and parylene CVD

2) Kelley System: Two zone atmospheric furnace with MFC gas flow control of N2 and O2

Electrical Test

Two fully equipped probestations with standard Agilent I-V and C-V characterazation equipment; hot chuck

Semiconductor Fabrication

Standard film deposition, etch, clean, lithography, etc. available in co-located OSU cleanroom

Analytical

OSU Electron Microscopy Facility: TEM & SEM

Spectroscopic ellipsometry, Atomic Force Microscopy, x-ray diffraction, x-ray reflectivity available in shared use facilities on campus

Misc

Other analytical support available through ONAMI facilities such as CAMCOR, CEMN, and EMIF

Probostat