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Prof. Conley is Program Chair of the 2017 American Vacuum Society (AVS) International Conference on Atomic Layer Deposition (ALD), Denver, CO, July 15-18, 2017:
ALD MoS2 project (sponsored by Sharp Labs of America):
From BALD Engineering, February 2016, "Oregon State present ALD of 2D alternate channel material MoS2 on 6 inch wafers" MoS2 is a two dimensional transition metal dichalcogenide material. With a direct bandgap of 1.8 eV when in monolayer morphology, it overcomes one of the limitations of graphene - the lack of a bandgap. The work demonstrates atomic layer deposition (ALD) of one to two monolayer MoS2 over 150 mm quartz and SiO2 patterned Si wafers. Applications such as an alternate channel material for MOS devices and catalysis applications are envisioned.
From Beneath the AVS Surface, April 2016, "Atomic Layer Deposition Shown to Produce Quality 2D Thin Films," In the latest issue of the Journal of Vacuum Science and Technology A, researchers at Oregon State University and Sharp Labs of America demonstrate how they were able to successfully use a technique known as atomic layer deposition (ALD) to deposit one to two monolayers of MoS2 on large area silicon and quartz substrates..."We found that we could consistently deposit a one-to-two monolayer 2DMoS2 film uniformly over a large surface area," Conley said. "Annealing the film in sulfur allowed us to see a strong photoluminescence peak, a hallmark of a monolayer material." .pdf
From OSU COE EECS Featured Stories, 4/27/16, "Blending electrical and chemical engineering," Making advances in two-dimensional semiconducting materials was beyond the scope of what Arturo Valdivia could imagine for himself when he was growing up in the small town of Nyssa in Eastern Oregon. But his first research project as a graduate student was not only published in the Journal of Vacuum Science & Technology A, but it was selected as the “Editor’s Pick” and was on the journal’s most read list. The article was also featured in Beneath the AVS Surface, a news publication for the American Vacuum Society... - .pdf
Glucose Sensing Project:
From Fall 2015 Momentum! (Oregon State COE Alumni Magazine) article about additive manufacturing, featuring Conley Lab student, Kamesh Mullapudi on the front cover. "Biosensors for continuous glucose monitoring"
NSF National Nanotechnology Coordinated Infrastructure (NNCI) sites announced: From Portland Business Journal, 9/17/15 Northwest Nanotechnology Infrastructure (NWNI), OSU lands a piece of $4.5M NSF nanotechnology grant
Diabetes Project: From 3D Print.com:Oregon State University Researchers Turn to 3D Printing to Help Manage Diabetes17Mar2015- Engineers at Oregon State University in collaboration with Pacific Diabetes Technologieshave used “additive manufacturing” to create an improved type of glucose sensor for patients with Type 1diabetes, part of a system that should work better, cost less and be more comfortable for the patient.
Prof. Conley IEEE Fellow: John Conley’s career honored with IEEE Fellow status - On Jan. 1st 2015, Prof. Conley was elevated to the grade of IEEE Fellow. "The total number selected in any one year cannot exceed one-tenth of one- percent of the total voting membership. IEEE Fellow is the highest grade of membership and is recognized by the technical community as a prestigious honor and an important career achievement."
Artificial Pancreas Project: Students partner to develop diabetes breakthrough - 12Dec2013 - OSU Industry Connect article about our collaboration with Pacific Diabetes Technologies
MIIM Diodes: Quantum MIIM Diodes Beat Silicon - 6Sept2013 - EETimes.com article about our recent paper in Applied Physics Letters
ZTO Memristors: Memristors based on transparent electronics - 21Sept2012 MaterialsToday.com article about our recent paper in Solid State Electronics.
MIM Diodes: Researchers claim better 'quantum tunneling' - 1Nov2010 EETimes article about our recent paper in Advanced Materials.
OSU Quick Links
John F. Conley, Jr.: jconley@ eecs.oregonstate.edu, ph (541)737-9874, 3089 Kelley Engineering Center